Micro-Slit Collimators for X-Ray/Gamma-Ray Imaging
- Friday, 01 July 2011
A hybrid photochemical-machining process is coupled with precision stack lamination to allow for the fabrication of multiple ultra-high-resolution grids on a single array substrate. In addition, special fixturing and etching techniques have been developed that allow higher0resolution multi-grid collimators to be fabricated.
Building on past work of developing a manufacturing technique for fabricating multi-grid, high-resolution coating modulation collimators for arcsecond and sub-arcsecond x-ray and gamma-ray imaging, the current work reduces the grid pitch by almost a factor of two, down to 22 microns. Additionally, a process was developed for reducing thin, high-Z (tungsten or molybdenum) from the thinnest commercially available foil (25 microns thick) down to ≈10
microns thick using precisely controlled chemical etching.
This work was done by Michael Appleby, Iain Fraser, and Jill Klinger of Mikro Systems Inc. for Goddard Space Flight Center. For further information, contact the Goddard Innovative Partnerships Office at (301) 286-5810. GSC-15628-1