Multi-Layer Far- Infrared Component Technology
- Created on Thursday, 01 March 2012
A method has been developed for fabricating high-reflectivity, multi-layer optical films for the terahertz wavelength region. A silicon mirror with 99.997-percent reflectivity at 70 μm wavelength requires an air gap of 17.50 μm, and a silicon thickness of 5.12 μm. This approach obtains pre-thinned wafers of about 20 mm thickness in order to measure their thickness precisely. A gold annulus of appropriate thickness is deposited to reach the required total thickness. This, in turn, has the central aperture etched down to the desired final silicon thickness. Also, the novel Bragg stack optics in this innovation are key to providing Fabry-Perot spectroscopy and improved spectral component technologies of unprecedented resolution, free spectral range, and aperture.
This work was done by Oliver Edwards of Zyberwear for Goddard Space Flight Center. GSC-15888-1
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