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Telescope Formation at L2 for Observing Earth's Atmosphere
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Date added: 09/01/2007 |
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This paper presents an analysis of deployment, navigation, and control problems related with a formation of two spacecraft in the neighborhood of Sun-Earth L2 point(on Sun-Earth line), which serves as an observatory observing Earth's atmosphere. |
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Extended-Range Ultrarefractive 1D Photonic Crystal Prisms
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Date added: 09/01/2007 |
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We describe the use of one-dimensional photonic crystals prism to separate a beam of polychromatic electromagnetic wave into its constituent wavelength. |
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Delamination-Indicating Thermal Barrier Coatings
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Date added: 09/01/2007 |
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A scheme was developed that enables thermal barrier coatings to become self-indicating for hidden delamination. The strategy relies on incorporating a luminescent sublayer at the base of the thermal barrier coating. |
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Broadband Achromatic Telecentric Lens
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Date added: 07/02/2007 |
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A new lens design features broadband achromatic performance and as well as telecentricity using a minimum number of spherical elements. |
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Radar Interferometer for Topographic Mapping of Glaciers and Ice Sheets
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Date added: 07/02/2007 |
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A Ka-band radar is discussed for mapping surface topography of glaciers and ice sheets at a high spatial resolution and high vertical accuracy, independent of cloud cover. |
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Rarefying Spectra of Whispering-Gallery-Mode Resonators
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Date added: 07/02/2007 |
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A method of cleaning the mode spectra of WGM optical resonators has been devised to make such resonators more suitable for use as narrow-band optical filters. |
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Slot-Antenna/Permanent-Magnet Device for Generating Plasma
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Date added: 07/02/2007 |
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A high-density plasma generated by microwave injection using a windowless slotted antenna has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low-power ion thruster applications or ion implantation applications. |
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Large-Area Permanent-Magnet ECR Plasma Source
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Date added: 07/02/2007 |
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An all-permanent-magnet Electron Cyclotron Resonance (ECR), 40-cm diameter plasma source was developed. The source is capable of producing uniform ion current densities at its exit plane and very low powers <200 W and discharge chamber pressures. The source is completely electrodeless and therefore elimates erosion issues (sputtering or contamination) The source could be used for manufacturing (processing silicon wafers) or electric propulsion. |
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