Products

Optical Vector Analyzer

Luna Technologies (Roanoke, VA) has introduced the Optical Vector Analyzer platform, (OVA 5000), a tool for loss, dispersion, and polarization measurements of modern optical networking equipment. It delivers single- measurement, all-parameter analysis of fiber optic components and assemblies up to 150 meters in length. A full C and L band characterization of all linear optical parameters can be completed in less than three seconds. The OVA uses swept-wavelength interferometry to measure all device characteristics in a single scan of a tunable laser. It characterizes all linear optical parameters including: Insertion Loss (IL), Polarization Dependent Loss (PDL), Group Delay (GD), Chromatic Dispersion (CD), Polarization Mode Dispersion (PMD), and Second Order PMD.

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Microscope Focus Controller

Prior Scientific (Rockland, MA) has introduced a new focus-only control system for modern microscopes. The ES10ZE Focus Controller is suitable for applications involving extended focus or Z-stacking. The controller includes a clear display that shows the current position at all times while separate controls are provided for rapid movement up or down along with the facility to change the speed of the focus movement. A manual focus knob is also provided for manual fine focusing and ease of operation.

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Camera Control Units

Toshiba Imaging Systems Division (Irvine, CA) has added two new camera control units (CCUs) designed to operate with the remote head, high-definition IK-HD1. The IK-HD1 model has an added DVI-I output on the rear panel, allowing customers to use HD control panels that accept DVI and/or HDMI signals, rather than more costly HD-SDI panels. The IK-HD1E CCU is designed to output HD-SDI and Y/Pb/Pr video signals in both 50 and 60 Hz.

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SWIR InGaAs Digital Video Linescan Camera

Sensors Unlimited (Princeton, NJ) has introduced the SU-LDH shortwave infrared (SWIR) InGaAs digital video linescan camera featuring line rates for 1024 pixels from 1 to over 46,000 lines per second with integrate-while-read snapshot acquisition. With a shortwave infrared wavelength response over 0.8 to 1.7 microns, this is suitable for electroluminescence and photoluminescence inspection of silicon and multi-junction cells. The SU-LDH features a 25-micron pixel pitch and a sharp 25-micron aperture mask that combine to provide a high SWIR imaging resolution. The 14-bit Camera Link compatible output and control is designed to integrate into machine vision systems for photovoltaic manufacturing at all stages of the process.

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Optical Replication Process

OPCO (Fitchburg, MA) offers a replication process that reproduces complex optics. The process transfers the profile of a precision optical surface from a master, creating an exact duplicate on a variety of substrates. The replicated optics are less expensive and in many cases lighter than the master. This process can be used to produce a range of both ruled and holographic diffraction gratings, reflective and transmission holographic optical elements, and dual wavelength gratings, as well as plano and conic sections. Substrate materials include glass, silicon carbide, ceramic, and metals such as beryllium, aluminum, titanium, stainless steel, and others. Diffraction gratings are produced in sizes up to 110mm × 110mm with groove densities from 40 g/mm to 3,600 g/mm, with available wavelengths from the deep UV to the far IR.

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Miniature Spectrometers

The XR-Series of miniature spectrometers from Ocean Optics (Dunedin, FL) covers all wavelengths from ~200 - 1050 nm and are available for USB2000+, JAZEL2000, and USB4000. The XR-2 grafting option provides broad UVNIR coverage with 500 lines/mm density without increasing the system footprint. They deliver an optical resolution of ~2.0 nm (FWHM) and are suitable for setups where both UV-VIS and VIS-NIR measurements are needed. They are also suitable for measurement of samples with response across the entire wavelength range, including solar irradiance, atomic emission line measurement, and some plasma applications.

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Optical Spectrometer

Mcpherson (Chelmsford, MA) has developed a 248/130 grazing incidence wavelength dispersive optical spectrometer that analyzes spectral light in the ~1 to 300 nm wavelength region (4 to ~1200 eV). It is useful for the vacuum ultraviolet as well as the extreme and soft X-ray wavelength region. Using direct detection CCDs, gated image intensifiers, or fast channel electron multipliers for detection, the instruments are vacuum leak checked and calibrated with respect to wavelength. Vacuum ultraviolet spectroscopy accessories, including various detector systems and wavelength calibration sources, are available from

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