Manufacturing & Prototyping

This innovation forms a sprayable polymer film using powdered precursor materials and an in-process heating method. This device directly applies a powdered polymer onto a substrate to form an adherent, mechanically-sound, and thickness-regulated film. The process can be used to lay down both fully dense...

USMC6 is a Fortran 90 computer program for post-processing in support of visualization of flows simulated by computational fluid dynamics (CFD). The name "USMC6" is partly an abbreviation of "TetrUSS — USM3D Solution Cutter," reflecting its origin as a post-processor for use with USM3D...

Slits for imaging spectrometers can now be fabricated to a precision much greater than previously attainable. What makes this possible is a micromachining process that involves the use of microlithographic techniques. This micromachining process supplants a prior machine-shop process.

A process for fabricating a planar array of dots having characteristic dimensions of the order of several nanometers to several hundred nanometers involves the formation and use of a thin alumina nanopore template on a semiconductor substrate. The dot material is deposited in the nanopores,...

A method for automated fabrication of flexible, electrically conductive patterns on cloth substrates has been demonstrated. Products developed using this method, or related prior methods, are instances of a technology known as "e-textiles," in which electrically conductive patterns are formed...

A process and method for fabricating multi-grid, high-resolution rotating modulation collimators for arcsecond and sub-arcsecond x-ray and gamma-ray imaging involves photochemical machining and precision stack lamination. The special fixturing and etching techniques that have been developed are used for...

A set of lecture slides describes an investigation of creep forming as a means of imparting desired curvatures to initially flat stock plates of carbon-reinforced ceramic-matrix composite (C-CMC) materials. The investigation is apparently part of a continuing effort to develop improved...

A process of deep reactive-ion etching (DRIE) using a fluorine-based gas mixture enhanced by induction-coupled plasma (ICP) has been demonstrated to be effective in forming high-aspect-ratio three-dimensional patterns in fused silica. The patterns are defined in part by an etch mask in the form of a thick,...